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1

Optimized lithography process for through-silicon vias-fabrication using a double-sided (structured) photomask for mask aligner lithography

Weichelt, Tina, Stuerzebecher, Lorenz, Zeitner, Uwe D.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2015

Language:

english

File:

PDF, 2.07 MB

english, 2015

2

Resolution enhancement for advanced mask aligner lithography using phase-shifting photomasks

Weichelt, T., Vogler, U., Stuerzebecher, L., Voelkel, R., Zeitner, U. D.

Journal:

Year:

2014

Language:

english

File:

PDF, 6.03 MB

english, 2014

3

SPIE Proceedings [SPIE SPIE Optical Engineering + Applications - San Diego, California, United States (Sunday 28 August 2016)] Current Developments in Lens Design and Optical Engineering XVII - Optical design and tolerancing of a hyperspectral imaging spectrometer

Johnson, R. Barry, Mahajan, Virendra N., Thibault, Simon, Liu, Chang, Straif, Christoph, Flügel-Paul, Thomas, Zeitner, Uwe D., Gross, Herbert

Year:

2016

Language:

english

File:

PDF, 670 KB

english, 2016

4

High performance diffraction gratings made by e-beam lithography

Zeitner, Uwe D., Oliva, Maria, Fuchs, Frank, Michaelis, Dirk, Benkenstein, Tino, Harzendorf, Torsten, Kley, Ernst-Bernhard

Journal:

Applied Physics A: Materials Science & Processing

Year:

2012

Language:

english

File:

PDF, 1.79 MB

english, 2012

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - High dynamic grayscale lithography with an LED-based micro-image stepper

Erdmann, Andreas, Kye, Jongwook, Eckstein, Hans-Christoph, Zeitner, Uwe D., Leitel, Robert, Stumpf, Marko, Schleicher, Philipp, Bräuer, Andreas, Tünnermann, Andreas

Year:

2016

Language:

english

File:

PDF, 7.43 MB

english, 2016

6

Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography

Bourgin, Yannick, Siefke, Thomas, Käsebier, Thomas, Genevée, Pascal, Szeghalmi, Adriana, Kley, Ernst-Bernhard, Zeitner, Uwe D.

Journal:

Year:

2015

Language:

english

File:

PDF, 2.82 MB

english, 2015

7

Comparison of hyperspectral imaging spectrometer designs and the improvement of system performance with freeform surfaces

Liu, Chang, Straif, Christoph, Flügel-Paul, Thomas, Zeitner, Uwe D., Gross, Herbert

Journal:

Year:

2017

Language:

english

File:

PDF, 931 KB

english, 2017

8

Intensity and phase fields behind phase-shifting masks studied with high-resolution interference microscopy

Puthankovilakam, Krishnaparvathy, Scharf, Toralf, Kim, Myun Sik, Naqavi, Ali, Herzig, Hans Peter, Weichelt, Tina, Zeitner, Uwe, Vogler, Uwe, Voelkel, Reinhard

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 6.74 MB

english, 2016

9

Application oriented complex polymer microoptics

A. Braeuer, P. Dannberg, U. Zeitner, G. Mann, W. Karthe

Journal:

Microsystem Technologies

Year:

2003

Language:

english

File:

PDF, 163 KB

english, 2003

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Double-sided diffractive photo-mask for sub-500nm resolution proximity i-line mask-aligner lithography

Lai, Kafai, Erdmann, Andreas, Bourgin, Yannick, Siefke, Thomas, Käsebier, Thomas, Kley, Ernst-Bernhard, Zeitner, Uwe D.

Year:

2015

Language:

english

File:

PDF, 1.11 MB

english, 2015

11

Flächenmanagement in der Immobilienwirtschaft (Grundlagen und konkrete Anwendung) ||

Zeitner, Regina, Marchionini, Michael, Neumann, Günter, Irmscher, Heike

Year:

2019

Language:

german

File:

PDF, 10.99 MB

german, 2019

12

Parabolic maneuvers of the Swiss Air Force fighter jet F-5E as a research platform for cell culture experiments in microgravity

Marc Studer, Gesine Bradacs, Andre Hilliger, Eva Hürlimann, Stephanie Engeli, Cora S. Thiel, Peter Zeitner, Beat Denier, Markus Binggeli, Thomas Syburra, Marcel Egli, Frank Engelmann, Oliver Ullrich

Journal:

Acta Astronautica

Year:

2011

Language:

english

File:

PDF, 1.28 MB

english, 2011

13

A CASE OF SADOMASOCHISTIC TRANSFERENCE: THE ANALYST'S CONTRIBUTIONS TO PERVERSE ENACTMENTS

ZEITNER, RICHARD M.

Journal:

The Psychoanalytic Quarterly

Year:

2008

Language:

english

File:

PDF, 119 KB

english, 2008

14

SPIE Proceedings [SPIE SPIE MOEMS-MEMS - San Francisco, California, United States (Saturday 1 February 2014)] Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII - Efficient fabrication of complex nano-optical structures by E-beam lithography based on character projection

von Freymann, Georg, Schoenfeld, Winston V., Rumpf, Raymond C., Zeitner, Uwe D., Harzendorf, Torsten, Fuchs, Frank, Banasch, Michael, Schmidt, Holger, Kley, Ernst-Bernhard

Year:

2014

Language:

english

File:

PDF, 823 KB

english, 2014

15

[OSA Optical Fabrication and Testing - Kohala Coast, Hawaii (2014..-..)] Classical Optics 2014 - Light Scattering of Optical Components for Space Applications

Schröder, Sven, Katsir, Dina, Zeitner, Uwe, Duparré, Angela

Year:

2014

Language:

english

File:

PDF, 300 KB

english, 2014

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Periodic sub-100nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning)

Erdmann, Andreas, Kye, Jongwook, Bourgin, Yannick, Voigt, Daniel, Käsebier, Thomas, Kley, Ernst-Bernhard, Zeitner, Uwe D.

Year:

2016

Language:

english

File:

PDF, 2.80 MB

english, 2016

17

Development, fabrication, and testing of an anamorphic imaging snap-together freeform telescope

Beier, Matthias, Hartung, Johannes, Peschel, Thomas, Damm, Christoph, Gebhardt, Andreas, Scheiding, Sebastian, Stumpf, Daniela, Zeitner, Uwe D., Risse, Stefan, Eberhardt, Ramona, Tünnermann, Andreas

Journal:

Year:

2015

Language:

english

File:

PDF, 2.54 MB

english, 2015

18

SPIE Proceedings [SPIE SPIE MOEMS-MEMS - San Francisco, California, USA (Saturday 21 January 2012)] Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V - Wafer scale fabrication of submicron chessboard gratings using phase masks in proximity lithography

Stuerzebecher, Lorenz, Harzendorf, Torsten, Fuchs, Frank, Zeitner, Uwe D., Schoenfeld, Winston V., Rumpf, Raymond C., von Freymann, Georg

Year:

2012

Language:

english

File:

PDF, 17.59 MB

english, 2012

19

Fused silica GRISMs manufactured by hydrophilic direct bonding at moderate heating

Kalkowski, G., Grabowski, K., Harnisch, G., Flügel-Paul, T., Zeitner, U., Risse, S.

Journal:

CEAS Space Journal

Year:

2017

Language:

english

File:

PDF, 1.17 MB

english, 2017

20

SPIE Proceedings [SPIE International Commission for Optics (ICO 22) - Puebla, Mexico (Monday 15 August 2011)] 22nd Congress of the International Commission for Optics: Light for the Development of the World - Parallel approach to MEMS and micro-optics interferometric testing

Kujawińska, M., Beer, S., Gastinger, K., Gorecki, C., Haugholt, K. H., Józwik, M., Lambelet, P., Paris, R., Styk, A., Zeitner, U., Rodríguez-Vera, Ramón, Díaz-Uribe, Rufino

Year:

2011

Language:

english

File:

PDF, 19.58 MB

english, 2011

21

SPIE Proceedings [SPIE SPIE Photonics Europe - Brussels, Belgium (Sunday 3 April 2016)] Nanophotonics VI - Large area gold coated nano-needles fabricated by proximity mask aligner lithography for plasmonic AR-structures

Andrews, David L., Nunzi, Jean-Michel, Ostendorf, Andreas, Bourgin, Yannick, Michaelis, Dirk, Käsebier, Thomas, Dannberg, Peter, Zeitner, Uwe D.

Year:

2016

Language:

english

File:

PDF, 482 KB

english, 2016

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Advanced mask aligner lithography (AMALITH)

Voelkel, Reinhard, Vogler, Uwe, Bramati, Arianna, Weichelt, Tina, Stuerzebecher, Lorenz, Zeitner, Uwe D., Motzek, Kristian, Erdmann, Andreas, Hornung, Michael, Zoberbier, Ralph, Conley, Will

Year:

2012

Language:

english

File:

PDF, 3.59 MB

english, 2012

23

A maskless laser-write lithography processing of thin-film transistors on a hemispherical surface

Geonwook Yoo, Hojin Lee, Daniela Radtke, Marko Stumpf, Uwe Zeitner, Jerzy Kanicki

Journal:

Microelectronic Engineering

Year:

2010

Language:

english

File:

PDF, 548 KB

english, 2010

24

SPIE Proceedings [SPIE 30th European Mask and Lithography Conference - Dresden, Germany (Tuesday 24 June 2014)] 30th European Mask and Lithography Conference - Multi-stencil character projection e-beam lithography: a fast and flexible way for high quality optical metamaterials

Behringer, Uwe F. W., Huebner, Uwe, Falkner, Matthias, Zeitner, Uwe D., Banasch, Michael, Dietrich, Kay, Kley, Ernst-Bernhard

Year:

2014

Language:

english

File:

PDF, 3.06 MB

english, 2014

25

Rowland ghost suppression in high efficiency spectrometer gratings fabricated by e-beam lithography

Heusinger, Martin, Banasch, Michael, Zeitner, Uwe D.

Journal:

Year:

2017

Language:

english

File:

PDF, 2.73 MB

english, 2017

26

Calculation of the Average Lenslet Shape and Aberrations of Microlens Arrays from Their Far-Field Intensity Distribution

Büttner, Alexander, Zeitner, Uwe D.

Journal:

Year:

2002

Language:

english

File:

PDF, 251 KB

english, 2002

27

Xenophobic attitudes in German police officers

Krott, Nora Rebekka, Krott, Eberhard, Zeitner, Ines

Journal:

International Journal of Police Science and Management

Year:

2018

Language:

english

File:

PDF, 243 KB

english, 2018

28

The pupillometric response as a parameter of self-esteem

Richard M. Zeitner, David G. Weight

Journal:

Journal of Clinical Psychology

Year:

1979

Language:

english

File:

PDF, 655 KB

english, 1979

29

Design considerations for high-brightness diffractive broad-area lasers

Büttner, Alexander, Zeitner, Uwe D., Kowarschik, Richard

Journal:

Journal of the Optical Society of America B

Year:

2005

Language:

english

File:

PDF, 987 KB

english, 2005

30

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 29 July 2001)] Laser Beam Shaping II - Design, analysis, and fabrication of refractive beam shaping elements for optical storage applications

Brenner, Karl-Heinz, Kuemmel, Peter, Zeitner, Uwe D., Dickey, Fred M., Holswade, Scott C., Shealy, David L.

Year:

2001

Language:

english

File:

PDF, 234 KB

english, 2001

31

Improving the brightness of a multi-kilowatt single thin-disk laser by an aspherical phase front correction

Blázquez-Sánchez, David, Weichelt, Birgit, Austerschulte, Armin, Voss, Andreas, Graf, Thomas, Killi, Alexander, Eckstein, Hans-Christoph, Stumpf, Marko, Matthes, Andre Lothar, Zeitner, Uwe Detlef

Journal:

Year:

2011

Language:

english

File:

PDF, 387 KB

english, 2011

32

SPIE Proceedings [SPIE Photonics West '97 - San Jose, CA (Saturday 8 February 1997)] Miniaturized Systems with Micro-Optics and Micromechanics II - E-beam lithography: an efficient tool for the fabrication of diffractive and micro-optical elements

Kley, Ernst-Bernhard, Schnabel, Bernd, Zeitner, Uwe D., Motamedi, M. Edward, Hornbeck, Larry J., Pister, Kristofer S. J.

Year:

1997

Language:

english

File:

PDF, 890 KB

english, 1997

33

Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect

Stuerzebecher, Lorenz, Harzendorf, Torsten, Vogler, Uwe, Zeitner, Uwe D., Voelkel, Reinhard

Journal:

Year:

2010

Language:

english

File:

PDF, 1.49 MB

english, 2010

34

On-axis diffractive elements with improved signal quality in the presence of fabrication errors and wavelength tolerances

Zeitner *, Uwe D., Dannberg, Peter

Journal:

Journal of Modern Optics

Year:

2005

Language:

english

File:

PDF, 227 KB

english, 2005

35

Multilevel blazed gratings in resonance domain: an alternative to the classical fabrication approach

Michaelis, D., Zeitner, U. D., Tünnermann, A., Oliva, M., Harzendorf, T.

Journal:

Year:

2011

Language:

english

File:

PDF, 1.35 MB

english, 2011

36

SPIE Proceedings [SPIE SPIE/COS Photonics Asia - Beijing, China (Thursday 9 October 2014)] Optical Design and Testing VI - Light scattering characterization of optical components: BRDF, BTDF, and scatter losses

Wang, Yongtian, Du, Chunlei, Sasián, José, Tatsuno, Kimio, Schröder, Sven, von Finck, Alexander, Katsir, Dina, Zeitner, Uwe, Duparré, Angela

Year:

2014

Language:

english

File:

PDF, 581 KB

english, 2014

37

SPIE Proceedings [SPIE 32nd European Mask and Lithography Conference - Dresden, Germany (Tuesday 21 June 2016)] 32nd European Mask and Lithography Conference - Advanced photomask fabrication by e-beam lithography for mask aligner applications

Behringer, Uwe F.W., Finders, Jo, Weichelt, T., Bourgin, Y., Banasch, M., Zeitner, U. D.

Year:

2016

Language:

english

File:

PDF, 769 KB

english, 2016

38

Hemispherical thin-film transistor passive pixel sensors

Geonwook Yoo, Tze-ching Fung, Daniela Radtke, Marko Stumpf, Uwe Zeitner, Jerzy Kanicki

Journal:

Sensors and Actuators A: Physical

Year:

2010

Language:

english

File:

PDF, 530 KB

english, 2010

39

Integrated-Optical Wavelength Sensor with Self-Compensation of Thermally Induced Phase Shifts by Use of a LiNbO_3 Unbalanced Mach–Zehnder Interferometer

Grusemann, Ulrich, Zeitner, Brit, Rottschalk, Matthias, Ruske, Jens-Peter, Tünnermann, Andreas, Rasch, Andreas

Journal:

Year:

2002

Language:

english

File:

PDF, 540 KB

english, 2002

40

Waveguide Grating Radial Polarizer for the Photolithography of Circularly Symmetrical Optical Elements

Jourlin, Yves, Tonchev, Svetlen, Parriaux, Olivier, Sauvage-Vincent, Jean, Harzendorf, Torsten, Zeitner, Uwe

Journal:

IEEE Photonics Journal

Year:

2012

Language:

english

File:

PDF, 1.10 MB

english, 2012

41

[IEEE 2017 Conference on Lasers and Electro-Optics Europe (CLEO/Europe) & European Quantum Electronics Conference (EQEC) - Munich (2017.6.25-2017.6.29)] 2017 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC) - Large area fabrication technologies for advanced photonic micro- and nano-structures

Zeitner, Uwe D.

Year:

2017

Language:

english

File:

PDF, 185 KB

english, 2017

42

Direct bonding for the encapsulation of transverse optical gratings

Kalkowski, Gerhard, Benkenstein, Tino, Rothhardt, Carolin, Fuchs, Frank, Zeitner, Uwe

Journal:

Microelectronic Engineering

Year:

2013

Language:

english

File:

PDF, 1.36 MB

english, 2013

43

Micromachined array-type Mirau interferometer for parallel inspection of MEMS

Albero, J, Bargiel, S, Passilly, N, Dannberg, P, Stumpf, M, Zeitner, U D, Rousselot, C, Gastinger, K, Gorecki, C

Journal:

Journal of Micromechanics and Microengineering

Year:

2011

Language:

english

File:

PDF, 921 KB

english, 2011

44

A history of the theory of IO's effect on Jupiter's decametric radiation

Mary E. Zeitner

Journal:

Astronomy Quarterly

Year:

1989

Language:

english

File:

PDF, 579 KB

english, 1989

45

Polarization Multiplexing of Diffractive Elements with Metal-Stripe Grating Pixels

Zeitner, Uwe D., Schnabel, Bernd, Kley, E.-Bernhard, Wyrowski, Frank

Journal:

Year:

1999

Language:

english

File:

PDF, 1.40 MB

english, 1999

46

Unambigous measuring of great retardations with a modified Senarmont method

Siegfried Kaufmann, U.w.e. Zeitner

Journal:

Optik - International Journal for Light and Electron Optics

Year:

2002

Language:

english

File:

PDF, 109 KB

english, 2002

47

SPIE Proceedings [SPIE SPIE MOEMS-MEMS - San Francisco, California, USA (Saturday 2 February 2013)] Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI - Freeform mirror fabrication and metrology using a high performance test CGH and advanced alignment features

Scheiding, Sebastian, Beier, Matthias, Zeitner, Uwe-Detlef, Risse, Stefan, Gebhardt, Andreas, von Freymann, Georg, Schoenfeld, Winston V., Rumpf, Raymond C.

Year:

2013

Language:

english

File:

PDF, 1.59 MB

english, 2013

48

Direct wafer bonding for encapsulation of fused silica optical gratings

Kalkowski, G., Zeitner, U., Benkenstein, T., Fuchs, J., Rothhardt, C., Eberhardt, R.

Journal:

Microelectronic Engineering

Year:

2012

Language:

english

File:

PDF, 851 KB

english, 2012

49

High modal discrimination for laser resonators with gaussian output beam: Letter

Zeitner, Uwe D., Wyrowski, Frank

Journal:

Journal of Modern Optics

Year:

1999

Language:

english

File:

PDF, 471 KB

english, 1999

50

SPIE Proceedings [SPIE SPIE Optical Engineering + Applications - San Diego, California (Sunday 1 August 2010)] Interferometry XV: Applications - Design, technology, and signal processing for DOE-based microinterferometer array applied in new generation M(O)EMS test equipment

Kujawinska, M., Józwik, M., Styk, A., Zeitner, U., Røyset, A., Beer, S., Moosburger, R., Gorecki, C., Gastinger, K., Furlong, Cosme, Gorecki, Christophe, Novak, Erik L.

Year:

2010

Language:

english

File:

PDF, 8.81 MB

english, 2010

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